Data set for Hybrid top-down/bottom-up fabrication of highly uniform and organized faceted AlN nanorod scaffold

Pierre-Marie Coulon & Gunnar Kusch
This dataset contains scanning electron microscopy (SEM) images, transmission electron microscopy (TEM) pictures and Catodoluminescence (CL) measurements carried out on AlN nanorod. The samples were fabricated via a hybrid top-down/bottom up approach. Displacement Talbot Lithography is used to fabricate Au/Ni metal dots to act as a hard etch mask. Ultrathin AlN nanorod arrays are created thanks to a two-step dry-wet etching process with first, chlorine-based dry etching of an AlN template and second, KOH-based wet...
1 citation reported since publication in 2018.
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