Dataset for \"‘Double’ Displacement Talbot Lithography: fast, wafer-scale, direct-writing of complex periodic nanopatterns\"

Pierre Chausse, Emmanuel Le Boulbar, Pierre-Marie Coulon & Philip Shields
This study developed a new low-cost nanolithographic tool for creating periodic arrays of complex, nano-motifs, across large areas within minutes. Displacement Talbot Lithography is combined with lateral nanopositioning to enable large-area patterning with the flexibility of a direct-write system. This enables the creation of different periodic patterns in short timescales using a single mask with no mask degradation. The dataset includes images of Matlab models (in .csv format) and SEM experimental pictures of the different...
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