Silicon and Dielectric Dry-Etch Recipes

Thomas Robert O'Brien Jr., Edmond Chow, Klara Nahrstedt, Bruce Lewis & John Michael Dallesasse
This work contains a series of SEM images and descriptions describing various etches used commonly for dielectrics (SiNx, SiO2) and Si. Some are failures, some are successes. Each was taken on the S4800 Hitachi SEM in the Micro and Nano Technology Lab at the University of Illinois at Urbana-Champaign during the RET taking place the summer of 2016.
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