Model of PE-CVD apparatus

Jürgen Geiser, V. Buck & M. Arab
In this paper we present the simulation of a chemical vapor deposition for metallic bipolar plates. For chemical vapor deposition, the delicate optimization between temperature, pressure and plasma power is important to obtain a homogeneous depositio. The aim is to reduce real-life experiments of a given CVD plasma reactor, based on a large physical parameter space we have a hugh amount of experiments. A detail study of the physical experiments on a CVD plasma reactor...
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