Morphology investigation of nanoporous anodic alumina films with image analysis

N.V. Lushpa, H.T. Dinh, K.V. Chernyakova & I.A. Vrublevsky
Aluminum films approximately 100 nm thick were deposited on silicon substrates (SiO2 / Si) by thermal evaporation in a vacuum. Porous anodic alumina films were obtained in a potentiostatic mode at 20 V in 0.3 M aqueous solution of oxalic acid and 1.8 M aqueous solution of sulfuric acid. The main pore diameter was determined using the ImageJ software from SEM images. An algorithm determining the pore diameter in porous anodic alumina films was developed....
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