Development of ultrathin niobium nitride and niobium titanium nitride films for THz hot-electron bolometers

Sven Holger Bedorf
The main focus of this work is the development of ultrathin NbN and NbTiN films. A reproducible and reliable deposition process for ultrathin NbN and NbTiN films for the use in phonon-cooled HEB devices was established. The ultrathin films were deposited on silicon (Si) substrates and on 2æm Si3N4 membranes by DC reactive magnetron sputtering. A method for the precise control of the nitrogen partial pressure by monitoring the target voltage has been introduced to...
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