Control of the nitrogen content in nanocomposite TiN/SiN coatings deposited by an arc-sputter hybrid process

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We have developed a reactive hybrid process for the deposition of TiN/SiNx composite layers where titanium is eroded from a conventional, industrial arc source and silicon is simultaneously sputtered from a magnetron target in argon/nitrogen atmosphere. The Si/N ratio of the SiNx phase in the film is related to the nitridation state of the silicon target which in turn is controlled by the Ar/N2 mixture. Monitoring the characteristics of the silicon target allows an effective...
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