Nano Imprint Lithography, a green technology

Andreas Bundgaard Fønss, Mads Bjerregaard Laursen, Martin Uhd Grønbech, Simone Tanzi, Anders Kristensen & Peter Bøggild
In the 3-week term June 2010 we have worked with Nano Imprint Lithography (NIL) in the course 33422. NIL is a nonconventional lithographic technique for high-throughput patterning of polymer nanostructures at great precision and at low costs. NIL relies on direct mechanical deformation of the resist material and can therefore achieve resolutions beyond the limitations set by light diffraction or beam scattering that are encountered in conventional techniques. In this presentation we will present NIL...
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