P2.0.14 Deposition of nanocrystalline WO3 thin film using magnetron sputtered multilayer structure in view of gas sensor applications

T. Pisarkiewicz, W. Maziarz, A. Rydosz, H. Jankowski & J. Sokulski
Tungsten trioxide films with nanocrystalline surface were manufactured by deposition of a three layer WO3/W/WO3 structure by RF sputtering and successive annealing of the structure in appropriate temperature range. Surface morphology was controlled by the thickness of the metal layer and upper oxide layer. WO3 sample after annealing was not homogeneous, revealing lower density in the region of upper layer. The obtained samples were sensitive to nitrogen dioxide, exhibiting better stability at lower working temperatures.