P2.0.19 Synthesis of tin dioxide thin films with different morphology by APCVD for gas sensor application

V. S. Popov, V. G. Sevastynov & N. T. Kuznetsov
Tin dioxide thin films with different morphology were obtained by atmospheric pressure chemical vapor deposition (APCVD) on silicon and alumina substrates. As a precursor used volatile tin compounds with crown ethers: [Sn(H2O)2Cl4]•(18-_r-6), [Sn(18-_r-6)Cl4]. The composition and morphology of coatings obtained were studied by atomic force microscopy (AFM), scanning electron microscopy (SEM), X-ray diffraction (XRD), Energy-Dispersive X-ray Spectrometry (EDX). The measurements of the resistance of coatings in different atmosphere were obtained.