D4.3 - Silicon probing tips coated with protective aluminum oxide thin films for fast tactile cantilever sensors

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Silicon microprobe tips are fabricated and integrated with piezoresistive cantilever sensors for fast surface roughness scanning systems. A combination of wet and inductively coupled plasma (ICP) cryogenic dry etching processes is employed to create high-aspect-ratio tips. For the wear-resistant tip coatings, atomic-layer deposition (ALD) technique is applied to deposit conformal ~14 nm thick aluminum oxide (Al2O3) layers using a binary reaction sequence in low thermal process with precursors of trimethyl aluminum (TMA) and water (H2O)....
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